在1970年,一个典型半导体芯片含有一万个元件,到1982年增加到66万个,现已出现100万个元件的芯片,芯片的大小基本上没有变化。元件数目增加了,元件的线宽必须越来越细,其最小特征尺寸由1975年的5微米减少到1982年的1微米。不久前,英国的 DubilierScientific 公司研制出一种聚焦离子束系统(SIBL100)。这种用探针产生的离子束可与电子束系统相比拟。采用的是液态金属离子源,离子源的基本结构包括装在存在液态金属的容器上的操针,针尖半径为10微米左右;加在发射极和分离极之 In 1970, a typical semiconductor chip contained 10,000 components, increasing to 660,000 in 1982. Now there are 1 million components of the chip, the size of the chip is basically unchanged. The number of components has increased, the line width of the components must be finer and smaller, and its minimum feature size has been reduced from 5 micrometers in 1975 to 1 micrometer in 1982. Not long ago, Dubilier Scientific in the UK developed a focused ion beam system (SIBL100). This probe-generated ion beam can be compared with the electron beam system. A liquid metal ion source is used. The basic structure of the ion source includes a needle mounted on a container in the presence of a liquid metal, with a tip radius of about 10 microns;