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推导出光刻成像的计算机模拟公式 ,讨论了光瞳滤波提高光刻分辨率的物理机理 ,给出了几个实验结果。提出逆傅利叶变换卷积滤波提高光刻分辨率的原理及方法 ,并和光瞳滤波进行了比较。结果表明 :加入适当的光瞳滤波 ,在数值孔径为 0 6 3的i线投影光刻曝光机上对 0 2 5 μm的密集型线条实现了 0 43的光强对比度。采用逆傅利叶变换卷积滤波在数值孔径为 0 6 0的 1 93nm深紫外投影光刻曝光机上实现0 1 3um左右的密集型线条 ,得到较高对比度的空间像光强分布。
The computer simulation formula of photolithographic imaging is deduced. The physical mechanism of pupil filtering to improve lithographic resolution is discussed. Some experimental results are given. The principle and method of using inverse Fourier transform convolution filter to improve the lithography resolution are proposed and compared with the pupil filter. The results show that with the help of the appropriate pupil filter, the intensity contrast of 0 43 is achieved for dense lines of 0 2 5 μm on an i-line lithography exposure machine with a numerical aperture of 0 6 3. Inverse Fourier transform convolution filter was used to achieve a dense line of about 0 1 3um on a 1 93 nm deep UV projection lithography machine with a numerical aperture of 0 6 0 to obtain a high contrast spatial light intensity distribution.