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研究在不同工艺条件下用直流反应磁控溅射技术在T10衬底上制备Cr-N涂层,并采用光电子能谱仪和XRD依次分析Cr-N涂层的表面结构和工艺参数对Cr-N涂层成分及相组成的影响。结果表明,Cr-N涂层在存放一段时间后表面产生复杂的Cr2O3相以及Cr(O,N)x相;常温下随着N2含量的增加,涂层相结构逐渐由Cr转变为化学比的CrN相。当N2含量为33.3%时,Cr-N涂层的相成分主要为Cr2N+CrN。并发现衬底偏压直接影响Cr-N系涂层的晶态及取向特征,当偏压增加到-130 V时,Cr-N涂层中β-Cr2N相结构逐渐转变为(110)和(300)取向结构。
The Cr-N coating was prepared on the T10 substrate by DC reactive magnetron sputtering under different technological conditions. The surface structure and process parameters of Cr-N coating were analyzed by using photoelectron spectrometer and XRD. N coating composition and phase composition of the impact. The results show that the Cr-N coating produces a complex Cr2O3 phase and a Cr (O, N) x phase on the surface after storage for a period of time. With the increase of N2 content, the phase structure of the coating gradually changes from Cr to chemical ratio CrN phase. When the N2 content is 33.3%, the phase composition of Cr-N coating is mainly Cr2N + CrN. It was found that the substrate bias directly affected the crystallographic and orientation characteristics of Cr-N coatings. When the bias voltage was increased to -130 V, the structure of β-Cr2N phase in Cr-N coatings gradually changed to (110) and 300) orientation structure.