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为了获得薄膜材料吸收率与深紫外激光照射能量密度间的对应关系,掌握薄膜材料深紫外吸收特性,应制定相应的吸收测量规范。介绍了激光量热法的原理及测试流程,分析了测试过程中的剂量效应、非线性吸收和不可恢复吸收等现象,提出了利用激光量热法测量应用于波长193nm紫外光刻系统的氟化物薄膜材料吸收率的方法,并进行了实际测量。根据所建立的测量方法,获得熔石英基底材料在193nm紫外光照射下的剂量效应及出现不可恢复吸收现象时相应的激光能量密度,进而测量出基底材料吸收率与激光能量密度之间的关系;通过热蒸发对基底镀氟化镁及氟化镧单层膜,测量镀膜后样品的吸收率与激光能量密度的关系,通过与镀膜前吸收率的对比,计算了两种薄膜材料吸收率与激光能量密度的关系,推算出薄膜材料在实际工作状态时的吸收率,并得到不同沉积温度下氟化镧薄膜材料吸收率、粗糙度与波纹度。实验结果证实了新提出测量方法的可行性,测量结果为改善系统成像质量以及延长元件使用寿命提供支持。
In order to obtain the corresponding relationship between the absorptivity of thin film material and the energy density of deep ultraviolet laser irradiation and to grasp the deep ultraviolet absorption characteristics of thin film materials, corresponding absorption measurement standards should be formulated. The principle and testing procedure of laser calorimetry are introduced. The effects of dose, non-linear absorption and non-recoverable absorption are analyzed. The laser calorimetry method is proposed to measure the fluoride used in the 193 nm UV lithography system The absorptivity of thin film material was measured and the actual measurements were made. According to the established measuring method, the dose effect of the fused silica substrate irradiated by 193nm UV light and the laser energy density corresponding to the unrecoverable absorption phenomenon were obtained, and then the relationship between the absorptance of the substrate material and the laser energy density was measured. By thermal evaporation on the substrate of magnesium fluoride and lanthanum fluoride single-layer film, measured after coating the sample absorption rate and laser energy density, compared with the pre-coating absorption ratio, calculated the absorption of two film materials and laser Energy density of the film material projected in the actual working state of the absorption rate, and get the different deposition temperature lanthana fluoride film material absorption rate, roughness and waviness. The experimental results confirm the feasibility of newly proposed measurement methods. The measurement results provide support for improving the imaging quality and extending the service life of the components.