研究了对向靶反应溅射法制备的CoN/CN软X射线多层膜的结构稳定性。研究表明,通过掺杂N原子可以将Co/C软X射线多层膜的结构稳定性提高100～200℃.400℃温度下退火,CoN/CN多层膜的周期膨胀仅为4％,700℃时周期结构仍然存在.N掺杂可以有效抑制CN层中sp~3键的形成,延迟层内结晶过程,进而减小了周期膨胀.Co-N和C-N间存在的强化学键可以减小结构弛豫.填隙N原子增大了Co原子运动的粘滞性,使hcp-Co和fcc-Co在相变温度以上共存,抑制了高温下晶粒长大. The structural stability of CoN / CN soft X-ray multilayers prepared by reactive sputtering was studied. The results show that the structure stability of Co / C soft X-ray multilayer films can be increased by 100 ~ 200 ℃ by doping N atoms.The cycle expansion of CoN / CN multilayer films is only 4% at 700 ℃, 700% ℃, the periodic structure still exists.N doping can effectively inhibit the sp ~ 3 bond formation in the CN layer and delay the crystallization process in the layer, thus reducing the cycle expansion.The strong chemical bond existing between Co-N and CN can reduce the structure Relaxation.The interstitial N atom increases the viscosity of Co atom movement, coexist hcp-Co and fcc-Co at the phase transition temperature, and restrain the grain growth at high temperature.