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In order to improve the anti-oxidation property of carbon/carbon (C/C) composites,a novel SiC-Si-ZrSiO_4 multiphase oxidation protective coating was produced on the surface of C/SiC coated carbon/carbon compos- ites by a pack cementation technique.The phase composition and microstructure of the as-prepared coatings were characterized by XRD (X-ray diffraction),SEM (scanning electron microscopy) and EDS (energy dis- persive spectroscopy).Oxidation behavior of the multiphase coated C/C composites was also investigated. It showed that the as-prepared coating characterized by excellent oxidation resistance and thermal shock re- sistance could effectively protect C/C composites from oxidation at 1773 K for 57 h in air and endure the thermal cycle between 1773 K and room temperature for 12 times,whereas the corresponding weight loss is only 1.47%.The excellent oxidation protective ability of the SiC-Si-ZrSiO_4 coating could be attributed to the C/SiC gradient inner layer and the multiphase microstructure of the coating.
In order to improve the anti-oxidation property of carbon / carbon (C / C) composites, a novel SiC-Si-ZrSiO 4 multiphase oxidation protective coating was produced on the surface of C / SiC coated carbon / carbon composites it by a pack cementation technique. The phase composition and microstructure of the as-prepared coatings were characterized by XRD (scanning electron microscopy) and EDS (energy dis-persive spectroscopy). Oxidation behavior of the multiphase coated C / C composites was also investigated. It showed that the as-prepared coating characterized by excellent oxidation resistance and thermal shock resistance can effectively protect C / C composites from oxidation at 1773 K for 57 h in air and endure the thermal cycle between 1773 K and room temperature for 12 times, whereas the corresponding weight loss is only 1.47%. The excellent oxidation protective ability of the SiC-Si-ZrSiO 4 coating could be attributed to the C / SiC gradient inner layer and the multiphase m icrostructure of the coating.