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目的探讨利用电离室自动曝光系统计算千伏指数n值,以及滤过质厚度、原子序数对n值的影响。方法利用北京万东HF-50E型高频X线摄影机及其电离室自动曝光系统,对5、10、15、20 cm厚纯净水水模,以及5、10 cm厚5%KI溶液和5 cm厚10%KI溶液水模,从低千伏到高千伏值进行系列曝光,记录每次曝光的实际mAs值,绘制等曝光量曲线,计算n值。结果千伏指数n值不仅随管电压升高而降低,而且还随水模厚度增加而增加,随滤过质原子序数增加而增加。用电离室自动曝光系统计算千伏指数n值,方法简便,由于直接用曝光量值计算,其实验误差较小。结论利用电离室自动曝光系统计算千伏指数n值,可以作为计算n值的方法之一,在教学或制定X线摄影条件中运用。
Objective To investigate the use of ionization chamber automatic exposure system to calculate the kV index n value, as well as the thickness of the filter, the atomic number of n value. Methods By using Beijing Wandong HF-50E high-frequency X-ray camera and its ionization chamber automatic exposure system, 5,10,15,20 cm pure water model and 5,10 cm thick 5% KI solution and 5 cm Thick KI solution 10% water mode, from low kV to high kV values for a series of exposures, record the actual mAs value of each exposure, draw the curve of exposure and calculate the value of n. As a result, the value of the kilovolt index n decreases not only with the rise of the tube voltage but also with the increase of the thickness of the mold, and increases with the increase of the atomic number of the filtration. The ion volute automatic exposure system to calculate the kV index n value, the method is simple, due to the direct use of exposure value calculation, the experimental error is small. Conclusion The ion volt automatic exposure system to calculate the kV index n value can be used as one of the methods to calculate the value of n in teaching or making use of X-ray photography conditions.