已研制了一种阻挡层陶瓷介质来满足低压电路中大容量、小尺寸电容器的需要。从1950年出现第一个专利以来,所进行的许多改进工作已使其达到大量生产的水平。化学计算的介质薄层通过氧扩散到导电缺氧结构内而形成的。这些薄层可以存在于陶瓷块表面或分布在晶粒边界。只有钛酸钡在其内添加少 A barrier ceramic dielectric has been developed to meet the needs of large capacity, small size capacitors in low voltage circuits. Since the first patent appeared in 1950, many improvements have been made to bring it to mass production. The stoichiometric thin layer of dielectric is formed by diffusion of oxygen into the conductive anoxic structure. These thin layers can exist on the surface of the ceramic block or at grain boundaries. Only barium titanate is added less