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以微齿轮图形结构作为规整模板 ,用约束刻蚀剂层技术对GaAs样品表面进行了加工刻蚀 .在有捕捉剂H3AsO3存在的情况下 ,规则微齿轮图形能够很好地在样品表面复制 .刻蚀结果与没有捕捉剂存在时的刻蚀结果做了比较 .另外还测试了不同方法制得膜板的性能 ,初步探讨了电化学模板的制作工艺 .
The micro-gear pattern was used as a regular template, and the surface of GaAs was etched by constrained etchant layer technique. In the presence of H3AsO3, the regular micro-gear pattern could replicate well on the sample surface. The etching results were compared with the etching results in the absence of capturing agent.In addition, the performance of the membrane made by different methods was tested, and the fabrication process of the electrochemical template was discussed preliminarily.