为了在硅片上蚀刻出集成电路,需使光线通过一个蒙片(蒙片上具有已设计好的电子线路)照在硅片表面的一层光敏薄膜上,经过一些处理,蒙片上的线路就会原原本本地复制到硅片上,这种工艺被称为照相平版印刷术。目前,一些科学家另辟新径,他们不是让光线通过固态的蒙片,而是将原子束直接通过由纯光线构成的“蒙片”。利用这种方法,可以 To etch an integrated circuit on a silicon wafer, the light is directed through a mask (the designed electronic circuit on the mask) to a thin layer of photosensitive film on the surface of the silicon wafer. After some processing, the traces on the mask The original copy of the original to the silicon, this process is called photolithography. At present, some scientists open a new path. Instead of letting light pass through a solid state mask, they pass the atomic beam directly through a “mask” of pure light. With this method, you can