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本文论述了金刚石薄膜的优点，比较了化学淀积金刚石薄膜的常用方法的优缺点，主要介绍了电容耦合射频化学气相淀积金刚石薄膜的原理和近期国际对典型电容耦合气相淀积设备的改进研究。
This paper discusses the advantages of diamond thin films, compares the advantages and disadvantages of the commonly used methods of CVD diamond films, mainly introduces the principle of capacitively coupled RF CVD diamond film and the recent international research on the improvement of typical capacitively coupled vapor deposition equipment .