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本专利是关于利用掩模和片子的对准图形进行对准的电—光对准系统,对准图形的象可以经过空间滤波器有选择地通过,每个对准图形包括至少两条非平行的线。对准图形的安排使掩模和片子上至少两个相应点的x、y座标位置可以用通过壹个单向敏感装置扫描对准图形的滤频象来感受。然后掩模和硅片定位到对准图形产生的信号指示出掩模和硅片的对应点已经对准为止。
This patent is directed to an electro-optical alignment system for alignment using alignment patterns of a mask and a wafer, the alignment pattern images being selectively passed through a spatial filter, each alignment pattern including at least two non-parallel The line. The alignment of the pattern is such that the x, y coordinate positions of at least two corresponding points on the mask and the film can be sensed using a filter image of the alignment pattern scanned by a one-way sensitive device. The mask and wafer positioning signal to the alignment pattern then indicates that the mask and the corresponding point of the wafer have been aligned.