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电阻阵列是目前发展最快和最有潜力的红外场景产生技术,可以满足大温度范围、高空间分辨率的要求。非均匀性是影响电阻阵列红外图像生成质量的一个重要因素。论述了非均匀性的成因和采取的一些措施,提出了一种改进的稀疏网格非均匀性修正方法,详细地描述了它的工作过程和原理。研究了非均匀性修正中电阻阵列响应特性的测量,给出了电阻阵列测试数据的处理和修正表格制备方法。对修正方法进行了数字仿真,结果表明:该方法可明显改善电阻阵列的非均匀性,提高成像质量。
Resistor array is currently the fastest growing and most promising infrared scene generation technology to meet the large temperature range, high spatial resolution requirements. Non-uniformity is an important factor affecting the quality of infrared image generation in a resistor array. Discusses the causes of non-uniformity and some measures to be taken, and proposes an improved sparse mesh inhomogeneity correction method, describes its working process and principle in detail. The measurement of the response characteristics of the resistor array in the non-uniformity correction is studied, and the test data processing of the resistor array and the preparation method of the correction table are given. The numerical simulation of the correction method shows that this method can obviously improve the nonuniformity of the resistor array and improve the imaging quality.