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The magnetic properties and microstructure of diffusion annealed [Ta/Nd/NdFeB/Nd/Ta] thin films have been investigated. The films were deposited on Si substrate with various thickness ratio of Nd/NdFeB layer (R=0-3.3), then diffused and crystallized by annealing at 650℃ for 10 min. The film without Nd layer showed soft magnetic behavior and high content of α-Fe phase. The films with R≥1 showed good hard magnetic properties with the high coercivity of about 20 kOe.
The magnetic properties and microstructure of diffusion annealed [Ta / Nd / NdFeB / Nd / Ta] thin films have been investigated. The films were deposited on Si substrate with various thickness ratios of Nd / NdFeB layer Diffused and crystallized by annealing at 650 ° C for 10 min. The film without Nd layer showed soft magnetic behavior and high content of α-Fe phase. The films with R ≧ 1 showed good hard magnetic properties with the high coercivity of about 20 kOe.