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采用二步热氧化法制备SnO2薄膜。首先把真空蒸发法制备的金属锡膜在低于锡熔点的氧气气流中氧化半小时,然后提高氧化温度至400-550℃,继续氧化2小时。通过XRD,SEM和UV-VIS光谱仪分析氧化温度对薄膜的晶体结构、表面形貌和光学性质的影响。XRD分析得知在氧化温度为400℃时能观察到不同的SnO2衍射峰。氧化温度在550℃时能观察到(1 1 0),(1 0 1),(20 0)和(2 1 1)衍射峰。如果氧化温度低于550℃,衍射峰(2 0 0)很难观察到。通过SEM测量,SnO2薄膜表面致密均匀,而且表面颗粒大小与氧化温度有很大的联系。通过UV-VIS透过光谱得知随着氧化温度的升高,SnO2薄膜的光透过率也升高,光学禁带宽度也随着氧化温度的升高而升高。这种制备SnO2薄膜的工艺具有适于大面积制造,低成本,过程容易控制等很多优点。
SnO2 thin films were prepared by two step thermal oxidation. Firstly, the metal tin film prepared by the vacuum evaporation method is oxidized for half an hour in an oxygen gas stream lower than the melting point of tin, and then the oxidation temperature is raised to 400-550 DEG C and the oxidation is continued for 2 hours. The effects of oxidation temperature on the crystal structure, surface morphology and optical properties of the films were analyzed by XRD, SEM and UV-VIS spectroscopy. XRD analysis revealed that different SnO2 diffraction peaks were observed at the oxidation temperature of 400 ℃. The (110), (110), (200) and (2 1 1) diffraction peaks were observed at 550 ℃. If the oxidation temperature is lower than 550 ° C, the diffraction peak (200) is hardly observed. The surface of SnO2 thin film is dense and uniform by SEM, and the surface particle size is greatly related to the oxidation temperature. The results of UV-VIS transmission spectroscopy showed that with the increase of oxidation temperature, the light transmittance of SnO2 film also increased, and the optical band gap increased with the increase of oxidation temperature. This SnO2 thin film preparation process has many advantages such as being suitable for large area manufacture, low cost, easy process control and the like.