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机电部十四所研制成功的高精密度感光胶——CNS正性光刻胶是为制作高精密度微波印制电路需要而研制的。该胶系邻叠氮荼醌脂类的正性光刻胶,其粘度低,在4～20厘泊/25℃范围内可调,流干性好,适宜采用低速旋转离心机涂布制作大板面、高精密度印制电路图形,其掩膜图形耐酸、碱性蚀刻,镀覆不掉膜,不渗镀。该胶光波吸收范围宽,可用一般紫外线曝光;并具有高的感光度;曝光时间短、宽容度大,显影不用有机溶剂,无味无毒无污染,使用方便,制作微波印制板导线的最小线宽可达0。
Electromechanical Department fourteen successful development of high-precision photosensitive plastic - CN positive photoresist is made for the production of high-precision microwave printed circuit needs and development. The adhesive ortho-azadirachtin lipid positive photoresist, its low viscosity, adjustable in the range of 4 ~ 20 centipoise / 25 ℃, flow-drying is good, suitable for low-speed rotating centrifuge coating large Board, high-precision printed circuit graphics, the mask graphics acid, alkaline etching, plating can not afford to film, not infiltration. The plastic light wave absorption range of a wide range of UV exposure can be general; and has high sensitivity; exposure time is short, large tolerance, the development of organic solvents, odorless non-toxic pollution, easy to use, the production of microwave PCB minimum line Width up to 0.