大规模集成电路要求图案复杂、线条细、单元面积大的掩模版,这使人工刻图照相的制版方式远不能满足要求。用计算机自动程序控制光学曝光装置,在感光干版上经过许多次的曝光自动拼合成一个复杂图案,这就是图形发生器自动制版方式。因为大规模集成电路掩模的精度高、图案非常复杂,因此拼图的精度和速度是两项关键问题。 Large-scale integrated circuits require complex patterns, thin lines, large unit area of ​​the reticle, which makes the manual engraving photographic plate far way to meet the requirements. With computer automatic program control optical exposure device, the photosensitive dry plate after many exposures automatically spell into a complex pattern, which is the automatic pattern-making plate. Because of the high precision and pattern complexity of large scale integrated circuit masks, the accuracy and speed of jigsaw puzzles are two key issues.