设计和制备了全向高反膜SiO2/TiO2,研究了它在不同脉冲宽度、不同脉冲能量的飞秒激光作用下的破坏阈值和烧蚀深度.利用发展的抽运-探针方法,研究了抽运脉冲作用下材料中导带电子的超快激发和能量沉积过程,建立并求解了飞秒激光激发材料和材料的激发对抽运光自身反作用的耦合动力学模型.模型较好地揭示了材料破坏的激发过程. The anti-throating threshold and ablation depth of omnidirectional antireflective film SiO2 / TiO2 were designed and prepared, and the damage thresholds and ablation depths under different pulse widths and different pulse energies were studied. By using the developed pump-probe method, The coupling kinetics model of self-reaction of the excitation of the femtosecond laser excitation material and the material to the pumping light is established and solved by the ultra-fast excitation and energy deposition process of the conduction band electrons in the material under the action of the pumping pulse.The model reveals well Material destruction of the excitation process.