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本文在简述圆柱形磁控溅射源镀膜装置工作原理的基础上，提出一种设计圆柱形磁控溅射源的《等效电流磁场计算法》。文中介绍了该方法的数学模型、计算公式及其磁感应强度Ｂ值的计算结果。文中还给出了圆柱形磁控溅射源永久磁铁Ｂ值的大量测试数据。由Ｂ值的分布及其规律证明：《等效电流磁场计算法》的计算结果完全可以作为设计圆柱形溅控溅射源的依据。综上两种数据，在进行该源的结构形状、几何参数、磁块大小及其垫片、零部件的位置及屏蔽罩的设置等结构设计方面，在进行诸如电压、气压等参数的选择与确定方面，文中均提出了有关的设计意见。为改善圆柱形磁控溅射源的性能，提高靶材利用率，文中对磁场Ｂ值和有关的结构参数亦作了一些理论研究，并且介绍了有关工程设计的计算公式及其设计方法
Based on the working principle of the cylindrical magnetron sputtering source coating device, this paper presents an equivalent current magnetic field calculation method for designing a cylindrical magnetron sputtering source. In this paper, the mathematical model of the method, the calculation formula and the calculation results of the magnetic induction B value are introduced. The paper also gives a large number of test data of the permanent magnet B value of cylindrical magnetron sputtering source. According to the distribution of B value and its rule, the calculation results of “Equivalent Current and Magnetic Field Calculation Method” can be used as the basis for designing a cylindrical spattering and sputtering source. To sum up the two kinds of data, in the structure design of the source such as the structure shape, geometric parameters, magnetic block size and its shims, parts position and shielding cover, such as the selection of voltage and pressure parameters Determine, the text has put forward the design ideas. In order to improve the performance of cylindrical magnetron sputtering source and improve the utilization of target, some theoretical researches have also been made on the B value of magnetic field and the related structural parameters, and the calculation formulas and design methods of engineering design are introduced