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分别采用中频磁控溅射、电弧离子镀及辉光弧光协同共放电混合镀(APSCD)三种方式在碳钢基体上制备TiN薄膜,采用原子力学显微镜、显微硬度计、台阶膜厚仪、电化学技术对薄膜表面形貌、显微硬度、膜厚、耐腐蚀性进行测试。研究结果表明:多弧离子镀薄膜颗粒的平均粗糙度为7.066 nm,混合镀薄膜颗粒的平均粗糙度为4.687 nm,在相同时间条件下,磁控溅射薄膜厚度为658 nm,混合镀膜厚度为1345 nm,混合镀工艺具有降低多弧离子镀粗糙度又可以克服磁控溅射沉积速率慢的优点。经过混合镀TiN薄膜后,基体表面显微硬度从226HV提高到1238 HV,在天然海水中测得混合镀膜层腐蚀电位比基体提高104mV。
The TiN films were prepared on carbon steel by three methods of medium frequency magnetron sputtering, arc ion plating and glow arc arc co-plating (APSCD) respectively. The mechanical properties of TiN films were characterized by atomic force microscopy, microhardness tester, Electrochemical technology to film surface morphology, microhardness, film thickness, corrosion resistance test. The results show that the average roughness of the multi-arc ion plating film particles is 7.066 nm, the average roughness of the mixed plating film particles is 4.687 nm, the magnetron sputtering film thickness is 658 nm at the same time, the thickness of the hybrid coating film is 1345 nm. The hybrid plating process has the advantages of reducing the roughness of multi-arc ion plating and overcoming the slow deposition rate of magnetron sputtering. After mixed TiN film, the microhardness of the substrate surface increased from 226HV to 1238 HV. The corrosion potential of the mixed coating layer measured in natural sea water was increased by 104mV.