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在12％(NH_4)_2SO_4水溶液(调pH=9)中,电位在200—800mV(SCE)范围内实现了M_(17)G镍基高温合金中M_(23)C_6相的选择性阳极浸蚀。用线性扫描电位法和恒电位阶跃法研究了浸蚀过程,建立了电化学极化控制下细小、弥散相的选择性阳极浸蚀过程模型。
Selective anode etching of M 23 C 6 phase in M 17 G superconducting superalloy was achieved in the range of 200-800 mV (SCE) in 12% (NH 4) 2 SO 4 aqueous solution (pH = 9) . The etching process was studied by linear sweep potential method and potentiostatic step method, and a selective anodic etching process model of fine and dispersed phase under the control of electrochemical polarization was established.