采用光学发射谱（ＯＥＳ）技术对脉冲ＴＥＡＣＯ＿２激光诱发ＳｉＨ＿４＋ＣＨ＿４系统击穿产生的等离子体辐射进行了时间分辨的光谱测量。结果表明等离子体内分子的各碎片发光均在气体击穿时刻开始出现，但具有不同的时间特性，由此探讨了气体分子的分解过程。分析结果支持激光诱发ＳｉＨ＿４＋ＣＨ＿４等离子体内的主要离解通道为产生Ｓｉ，Ｃ原子通道的分解动力学机制的解释。据此观点讨论了气体分解碎片间的反应过程。实验与理论符合较好。 The optical emission spectrum (OES) technique was used to time-resolved the spectral emission of plasma generated by pulsed TEACO_2 laser-induced SiH_4 + CH_4 system breakdown. The results show that all the fragments of the plasma molecules emit light at the time of gas breakdown, but have different time characteristics. Thus, the decomposition process of gas molecules is discussed. The results support the explanation of the kinetic mechanism for the decomposition of the Si and C atomic channels by laser-induced dissociation channels in the SiH 4 + CH 4 plasma. According to this point of view, the reaction between gas-decomposed fragments is discussed. Experiment and theory are in good agreement.