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基于快速热处理技术,对快速退火炉的特点进行了阐述,介绍了快速退火炉的腔室结构,从综合分析设备的基础上阐述了影响工艺质量的主要因素。加热灯使用寿命会影响腔室的温度均匀性,更换加热灯和调整各灯组的功率因子可以提高温度均匀性。保护气体流量对晶片的边缘效应会导致晶片受热不均匀进而影响到工艺的均匀性,调整保护气体流量也是保证工艺质量的关键。金属腔体的洁净度会影响到热辐射的均匀性和升温速率,必须定期清理。石英腔体的洁净程度会影响到温度测量的精度,应定期清理腔体并进行温度校正。
Based on the rapid heat treatment technology, the characteristics of the rapid annealing furnace are described. The chamber structure of the rapid annealing furnace is introduced. The main factors affecting the quality of the process are described based on the comprehensive analysis equipment. The service life of the heater will affect the temperature uniformity of the chamber. Changing the heater and adjusting the power factor of each lamp improves the temperature uniformity. Shielding gas flow on the edge of the wafer will lead to uneven wafer heating and thus affect the uniformity of the process, adjusting the flow of shielding gas is also the key to ensure the quality of the process. The cleanliness of the metal cavity will affect the uniformity of heat radiation and heating rate, must be cleaned regularly. The cleanliness of the quartz chamber will affect the accuracy of temperature measurement, the chamber should be regularly cleaned and temperature corrected.