设计和试验了一种分步重复机和一种掩模测量仪。研制这两种机器的一个重要目的是实现小的重复误差。为此目的,在测最技术方面、在定位系统方面以及在设计原则上应持一些特殊的原则,这些原则将连同计算机控制的概念一起讨论。有一种新研制成的两坐标光电显微镜正作为测量仪的传感器使用。其重复误差,对分步重复机来说,在不同的掩模版上测得为0.1μ,对掩模测量仪来说为0.08μ(1σ值)。 A step repeat machine and a mask gauge were designed and tested. An important goal in developing both machines is to achieve small repetitive errors. For this purpose, special principles should be found in locating the system, as well as in the design principles, which will be discussed together with the concept of computer control. A newly developed two-coordinate electro-optic microscope is being used as the sensor of the measuring instrument. The repeat error was 0.1 [mu] [mu] for a reticle and 0.08 [mu] [sigma] for a mask gauge for a stepper.