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针对数字投影光刻技术大面积图形曝光的需求,提出了一种基于灰度模板调制的图形拼接方法,包括图形分割、模板设计、子图形灰度调制、子图形曝光4个步骤。图形曝光前,需要将曝光图形分割为多帧大小为1024pixel×768pixel的多个子图形,然后每个子图形与对应模板相乘,实现曝光子图形的预处理。基于数字微镜(DMD)对灰度图形的调制原理,设计了可行的边界灰度调制模板。给出了图形分割的基本方法以及模板设计的原则。计算机仿真实验展示了图形拼接的过程。实验结果表明,该方法能较好地解决大面积图形曝光存在的拼接问题,改善了图形刻蚀的质量。
In order to meet the needs of large-area graphic exposure of digital projection lithography, a graphic mosaic method based on gray-scale template modulation is proposed, which includes four steps of image segmentation, template design, sub-graphics gray-scale modulation and sub-graphics exposure. Before the pattern exposure, the exposure pattern needs to be divided into a plurality of sub-patterns with a size of 1024 pixels × 768 pixels, and each sub-pattern is multiplied with the corresponding template to pre-process the exposure sub-pattern. Based on the modulation principle of digital micromirrors (DMDs) for grayscale images, a feasible boundary grayscale modulation template is designed. The basic method of graphic segmentation and the principle of template design are given. Computer simulation shows the process of graphics mosaic. Experimental results show that this method can solve the splicing problem of large-area pattern exposure and improve the quality of pattern etching.