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设计并制造了一种基于静电排斥力的大冲程MEMS变形镜,此变形镜采用了三个多晶硅结构层和一个金属反射层的设计。利用表面硅工艺完成了变形镜的加工,结合有限元分析软件和白光干涉仪对三种不同驱动器电极空间分布方式的静电排斥型变形镜进行了分析和研究。测试结果表明,静电排斥型变形镜在200V下能实现1.7μm以上的位移,冲程较传统静电吸引型变形镜有显著提高。在相同电压下,第三层多晶硅作为边缘电极时的变形镜获得的位移最大,在210V下达到2.42μm。
A large-stroke electrostatically repulsive-based MEMS deformable mirror was designed and fabricated using three polysilicon structured layers and one metallic reflective layer. The processing of the deformable mirror was finished by using the surface silicon process. The electrostatic repulsion deformable mirrors of three different driver electrode spatial distribution modes were analyzed and studied with the combination of the finite element analysis software and the white light interferometer. The test results show that the electrostatic repulsion deforming mirror can achieve the displacement of more than 1.7μm at 200V, the stroke is significantly improved compared with the traditional electrostatic attracting deforming mirror. Under the same voltage, the deformation of the third layer polycrystalline silicon as the edge electrode obtained the largest displacement, reaching 2.42μm at 210V.