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在超薄栅介质膜的制备技术中，膜生成前，用稀ＨＦ酸进行表面处理，能使生成的超薄膜均匀性、完整性提高，从而使膜的击穿、漏电得到改善。
In the preparation of ultra-thin grid dielectric films, before the film is formed, surface treatment with dilute HF acid can improve the uniformity and integrity of the ultra-thin film to be formed, thereby improving the breakdown and leakage of the film.