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在室温下 ,用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳膜。对膜进行了表面形貌观察 ,测试并分析了膜的拉曼散射光谱和傅里叶变换红外光谱。发现膜含微晶石墨杂质较少 ,观察到 12 0 0cm-1附近的非晶金刚石拉曼峰 ,膜层在红外的光透过率高 ,在硅衬底上适宜于制作波长短于 8μm的红外增透膜。
At room temperature, amorphous carbon films with different thickness were deposited on the surface of monocrystalline silicon substrate by laser ablation of graphite target. The surface morphology of the film was observed, and the Raman scattering and Fourier transform infrared spectra of the film were tested and analyzed. It is found that the film contains less microcrystalline graphite impurities and an amorphous diamond Raman peak near 1200cm-1 is observed. The film has a high light transmittance in the infrared and is suitable for fabricating a silicon substrate with a wavelength shorter than 8μm Infrared antireflection film.