A new concept to realize negative refractive index in non-resonance spectrum using chiral metamaterial is proposed. A low-index metamaterial is added to diminish the effective refractive index of the combined structure. Simulation and material parameter r
A new photolithography technique for 248 nm based on the interference of surface plasmon waves is proposed and demonstrated by using computer simulations. The basic structure consists of surface plasmon polariton (SPP) interference mask and multi-layer fi