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In the present paper,diamond thin films have been formed on Sisubstrate by DC plasma chemical vapor deposition from mixture gases ofmethane and hydrogen.The effect of deposition conditions on the formationand quality of diamond films are studied.The role of atomic hydrogen is discussed and a new concept of the Sea of Atomic Hydrogen is suggested.
In the present paper, diamond thin films have been formed on Sisubstrate by DC plasma chemical vapor deposition from mixture gases of methane and hydrogen. The effect of deposition conditions on the formation and quality of diamond films are studied. The role of atomic hydrogen is discussed and a new concept of the Sea of Atomic Hydrogen is suggested.