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用阴离子聚合法原位一步合成了PS/MoS2插层复合材料,通过XRD、FT-IR及SEM对复合材料的结构进行了表征,结果表明,MoS2经聚苯乙烯插层后,层间距扩大了0.672nm,形成的是插层型复合材料。通过XPS对一步法和两步法(剥层重堆法)制备的插层复合材料的氧化行为进行了研究,结果表明,一步法和两步法合成的PS/MoS2插层复合材料的氧化行为不同,前者主要是MoS2中的Mo4+氧化为Mo6+,后者主要是MoS2中的S2-氧化为S6+。
The PS / MoS2 intercalation composite was synthesized in situ by anionic polymerization. The structure of the composites was characterized by XRD, FT-IR and SEM. The results showed that the interlayer spacing of MoS2 expanded by polystyrene intercalation 0.672nm, forming an intercalated composite. The oxidation behavior of the intercalated composites prepared by one-step and two-step methods (stripping and re-stacking) was investigated by XPS. The results showed that the oxidation behavior of PS / MoS2 intercalated composites synthesized by one-step and two- , The former is mainly the oxidation of Mo4 + in MoS2 to Mo6 +, and the latter is mainly the oxidation of S2- to S6 + in MoS2.