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采用脉冲激光沉积法(PLD)在不同温度单晶硅基底上制备了WSx固体润滑薄膜.利用扫描电子显微镜(SEM)、X射线能谱仪(EDS)、X射线衍射仪(XRD)对薄膜的成分、形貌和微观结构进行了分析,采用球-盘式磨损试验机测试了薄膜在大气环境下(相对湿度50%～60%)的摩擦学特性.结果表明:室温下所获得的薄膜为微晶结构;在RT～300℃范围内,随着温度的升高,薄膜表面趋于光滑、致密,且形成晶态WSx的趋势逐渐增大,薄膜与基底间的结合力增大,但薄膜中S和W的含量之比(S/W比)从1.84逐步下降到1.49.薄膜的摩擦系数在RT～200℃范围内与其S/W比呈反比关系,在300℃条件下,薄膜中形成了大量的WS2晶体,摩擦系数最低且耐磨性能也最好.
WSx solid lubricant films were prepared by pulsed laser deposition (PLD) on monocrystalline silicon substrates with different temperature.The films were characterized by scanning electron microscopy (SEM), X-ray energy dispersive spectroscopy (EDS) and X-ray diffraction Composition, morphology and microstructure of the film were investigated.The tribological properties of the film under atmospheric environment (relative humidity 50% ~ 60%) were tested by a ball-disc wear tester.The results showed that the films obtained at room temperature were In the temperature range of RT ~ 300 ℃, the surface of the film tends to be smooth and dense with the increase of temperature. The tendency of the formation of WSx is gradually increased, and the binding force between the film and the substrate is increased. However, The content ratio of S and W (S / W ratio) decreased gradually from 1.84 to 1.49.The friction coefficient of film was inversely proportional to its S / W ratio at RT ~ 200 ℃, and was formed in the film at 300 ℃ A large number of WS2 crystals, the lowest friction coefficient and wear resistance is also the best.