TiB2/Aln multilayers which have constant TiB2 layer thickness (7 nm) and various AlN layer thicknesses ranging from 1.1 nm to 4.4 nm were synthesized on Si (100) substrate by magnetron sputtering. The influence of different AlN layer thicknesses on mechanical properties of multilayers were studied by X-ray diffractometry, Scanning electron microscopy, Tran mission electron microscope, X-ray photoelectron spectroscopy and Nano Indenter XP system. All multilayers exhibited stable and sharp multilayered interface structures, producing them higher hardness and elastic modulus than the value of monolithic AlN and TiB2 coatings. At the substrate negative bias of 60 V, the hardness (38.9 GPa) and elastic modulus (540.9 GPa) were obtained in the multilayers with the AlN layer thicknesse (3.2 nm). This hardest multilayer also showed the improved residual stress. These enhancement effects in TiB2/AlN nanoscale multilayers were likely the result of the resistance to dislocation glide and columnar grain growth across interface as well as nanoscale strain optimization as the evolution of layer crystalline. This work proved that magnetron sputtering can produce nanoscale TiB2/Aln multilayers with higher hardness and lower compressive stress by controlling layer thicknesse. These mechanical properties strongly depended on the modulation structure.