CrN thick comings were deposited on silicon (111) by middle-frequency magnetron sputtering system under various parameters.The microstructure was analyzed by X-ray diffraction (XRD),scanning electron microscopy (SEM),atomic force microscopy (AFM) and the mechanical properties were evaluated by a micro-hardness test while the thickness of the films was measured by using a stylus profiler.Rounded domes figure and typical columnar grain morphology are found in all the films.As N2 flow rate or bias voltage is increased too high,the microstructure of CrNx films was changed from CrN to Cr2N.The films deposited at target power density of 20.0 w/cm2 exhibit excellent integrated properties.Fine small grain can grow well with the appearance of the Cr2N.