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5. Application of Pulse Modulated Radio Frequency Plasmas in Atomic Layer Deposition

Application of Pulse Modulated Radio Frequency Plasmas in Atomic Layer Deposition

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：nmg_zl

【摘 要】

：

Atomic layer deposition (ALD) has recently been widely studied for the precisely controlling of thickness and uniformity,especially for the high-k materials.

【作 者】

：

Xinkun Liu Aidi Li Tongfei Cui Jie Zhang 

【机 构】

：

College of Science, Donghua Univesity, Shanghai 201620, P. R. China

【出 处】

：

2011年第三届微电子及等离子体技术国际会议

【发表日期】

：

2011年9期

【关键词】

：

Atomic layer deposition Pulse modulated plasmas Temperature 

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Atomic layer deposition (ALD) has recently been widely studied for the precisely controlling of thickness and uniformity,especially for the high-k materials.

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