Laser-induced fluorescence and electric probes for the measurement of plasma flows

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户:xdzc2009cccc
下载到本地 , 更方便阅读
声明 : 本文档内容版权归属内容提供方 , 如果您对本文有版权争议 , 可与客服联系进行内容授权或下架
论文部分内容阅读
To establish and confirm the method of deduction of Mach numbers for the case of collisional plasmas,one needs not only to develop the physical model but also to verify the model by the independent diagnostics such as laser-induced fluorescence (LIF) method,since almost all the existing probe theories are for the case of collisionless and stationary plasmas.
其他文献
Aryl silane,especially,p-bis(triphenylsilyl)benzene [UGH2] has been used to study blue phosphorescent organic light-emitting diodes [PhOLEDs] because of high triplet energy.
We studied the characteristics of the amorphous aluminum oxide (a-Al2O3) inorganic film deposited by radio-frequency magnetron sputtering as an alternative alignment layer for liquid crystal display (
The conception of ultra-thin shadow mask PDP is proposed on the basis of existing shadow mask PDP technology.Compared with the traditional shadow mask PDP, the ultra-thin shadow mask PDP uses the ultr
Abstract:Integrated optical waveguides structures fabricated on SOI (silicon-on-insulator) based on MEMS (micro electron mechanical system) technology are promising for large scale integration and low
This paper investigates the changes in the optical and discharge characteristics during the panel aging process in ac plasma display panel when applying the overlapped sustain waveform.
To reduce the jitter time is one of key technology to achieve HDTV PDP,and it is useful way to improve the jitter response characteristic to spray the MgO crystal as the CEL (crystal emission layer) o
Atomic layer deposition is used in applications where inorganic or organic materials layers with uniform thickness down to the nanometer range are required.
Currently SF6 chemistry is mainly used for dry etching a SiNx thin film which is used for the dielectric layer in the TFT-LCD,its GWP (Global Warming Potential) index is relatively high in the PFC (Pe
In low pressure low temperature plasmas,the dual frequency plasma has been proved to be a very promising way of separate control of electron density and ion energy and producing uniform plasmas over l
Characteristics of weakly magnetized inductively coupled plasma (MICP),a plasma source utilizing cavity mode of low frequency branch of right hand circularly polarized wave,are investigated using self