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[会议论文] 作者：Moonkeun Kim,Hanbyeol Jang,Yong-Hwa Lee,Kwang-Ho Kwon,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
Plasma process has gained widespread use in the manufacture of micro- and nano- electronics technology since it can increase the integrated density of devices....
Etching characteristics of thin SiON films using a liquefied perfluorocarbon precursor of C6F12O wit
[期刊论文] 作者：Junmyung LEE,Yunho NAM,Jongchan LEE,Hyun Woo LEE,Kwang-Ho KWON,
来源：等离子体科学和技术（英文版） 年份：2020
Perfluorocarbon gas is widely used in the semiconductor industry.However,perfluorocarbon has a negative effect on the global environment owing to its high globa...
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