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On-chip plasmonic spin-Hall nanograting for simultaneously detecting phase and polarization singular
[期刊论文] 作者：Fu Feng,Guangyuan Si,Changjun Min,Xiaocong Yuan,Michael Somekh,
来源：光：科学与应用（英文版） 年份：2020
Phase and polarization singularities are important degrees of freedom for electromagnetic field manipulation. Detecting these singularities is essential for mod...
All-Optical Active Plasmonics Based on Noble Metallic Nanostructures Embedded in Photoresponsive Liq
[会议论文] 作者：Yan Jun Liu,Guangyuan Si,Eunice Sok Ping Leong,Jing Hua Teng,
来源：The 4rd Symposium on Liquid Crystal Photonics(SLCP2015)(第四届液 年份：2015
Active plasmonics has been an interesting and important topic recently.Here we demonstrate all-optically tunable manipulation of a hybrid system that integr...
[会议论文] 作者：Guangyuan Si,Xiaoxiao Jiang,Aijuan Song,Yuqian Zhao,Linjuan Yang,Yongtao Wei,Jiangtao Lv,Fengwen Wang,
来源：International Conference on Nanoscience & Technology,China 2 年份：2013
To date, the most frequently used top-down fabrication methods for nanodevices are electron-beam lithography (EBL) and focused ion beam (FIB) techniques.EBL is capable of defining diverse patterns dow...
[会议论文] 作者：Jiangtao Lv,Qiongchan Gu,Xiaoxiao Jiang,Aijuan Song,Yuqian Zhao,Liqin Liang,Yongtao Wei,Fengwen Wang,Guangyuan Si,
来源：International Conference on Nanoscience & Technology,China 2 年份：2013
Focused ion beam (FIB) is a versatile and powerful instrument which can define patterns down to the nanoscale.FIB can be expected to produce sharp features and achieve high resolutions by precisely co...
[会议论文] 作者：Jiangtao Lv,Linjuan Yang,Qiongchan Gu,Xiaoxiao Jiang,Baojian Zhang,Liqin Liang,Yan Liu,Fengwen Wang,Guangyuan Si,
来源：International Conference on Nanoscience & Technology,China 2 年份：2013
The FIB system utilizes ions (gallium, normally) produced by a liquid-metal source to scan over a sample surface and sputter away bulk material.It has been extensively utilized for specimen preparatio...
[会议论文] 作者：Guangyuan Si,Zhenhe Ma,Yuqian Zhao,Linjuan Yang,Aijuan Song,Yan Liu,Qiongchan Gu,Xiaoxiao Jiang,Jiangtao,
来源：International Conference on Nanoscience & Technology,China 2 年份：2013
Interference lithography (IL) is a pattern definition technique which can define micrometer and sub-micrometer large area patterns with tunable periodicities.IL has irreplaceable advantages compared w...
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