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[会议论文] 作者:Chaofan Xue,Shumin Yang,Haigang Liu,Liansheng Wang,Jun Zhao,Yanqing Wua,Renzhong Tai, 来源:The 6th International Conference on Nanoscience and Technolo 年份:2015
  A large area exposure technology with high-resolution nanostructure using broadband soft X-ray interference lithography(XIL)is developed by beamline BL08U1B...
[会议论文] 作者:Chaofan Xue,Shumin Yang,Haigang Liu,Liansheng Wang,Jun Zhao,Yanqing Wua,Renzhong Tai, 来源:The 6th International Conference on Nanoscience and Technolo 年份:2015
A large area exposure technology with high-resolution nanostructure using broadband soft X-ray interference lithography(XIL)is developed by beamline BL08U1B at SSRF [1]....
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