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用直流溅射法在室温K9玻璃基底上制备了8.2nm—107.2nm范围内不同厚度的Ag薄膜,并用X射线衍射及计算机辅助优化程序对薄膜的微结构和光学常数进行了测试分析.结构分析表明制备的Ag薄膜均呈多晶状态,晶体结构均呈面心立方;随着膜厚的增加,薄膜的平均晶粒尺寸逐渐增大,晶面间距逐渐减小.计算机辅助优化编程计算的薄膜光学常数分析表明在波长550nm处,当膜厚小于17.5nm时,随着膜厚的增加,折射率n快速减小,消光系数k则快速增大;当膜厚大于17.5nm时,n和k逐渐趋于稳定.
Ag films with different thicknesses from 8.2nm to 107.2nm were prepared on a K9 glass substrate at room temperature by DC sputtering and the microstructures and optical constants of the films were analyzed by X-ray diffraction and computer-aided optimization. The results show that the prepared Ag films are polycrystalline and their crystal structures are face-centered cubic. As the film thickness increases, the average grain size of the films gradually increases and the interplanar spacing decreases. Optical constant analysis shows that when the film thickness is less than 17.5nm at 550nm, the refractive index n decreases rapidly and the extinction coefficient k increases rapidly with the film thickness increasing. When the film thickness is larger than 17.5nm, n and k Gradually stabilized.