二次荧光校正计算是微颗粒X射线定量分析中极为困难的问题。本文基于一定物理模型,提出了任意形状、尺寸的多元系颗粒样品二次荧光发射强度计算方法,导出了轴对称旋转体颗粒荧光校正计算公式。设一定能量电子束垂直入射到多元颗粒表面上(图1),令S_j表示颗粒中元素j所产生的初次特征X射线光子(称X_j光子)的空间分辨率。考虑到初次特征X光光子及被激发的二次荧光光子分布的轴对称性,我们假定:1.X_j光子在颗粒中呈球状分布,且其总强度I_1集中在光子球心O′。2.颗粒尺寸小荧光激发范围时,二次荧光光子集中在颗粒体中心。由此可以计算强度为I_j、处于O′位置的X光点光源对整个颗粒体激发荧光的贡献。图1中dφ对应园环的立体 Secondary fluorescence correction calculation is a very difficult problem in the quantitative analysis of X-ray micro-particles. In this paper, based on a certain physical model, a method for calculating the second fluorescence emission intensity of a multi-type particle sample of arbitrary shape and size is proposed, and the formula for calculating the fluorescence correction of the axisymmetric rotating particle is derived. Let a certain energy of the electron beam perpendicularly incident on the surface of the multivariate particles (Figure 1), so that S_j said particles in the element j generated by the first characteristic X-ray photons (called X_j photons) spatial resolution. Taking into account the axial symmetry of the first characteristic X-ray photons and the excited second-order fluorescence photons, we assume that: 1. X_j photons are spherical in the particles and their total intensity I_1 is centered at the photon center O ’. 2. Particle size Small fluorescence excitation range, the second-order fluorescence photons concentrated in the center of the particle. From this it is possible to calculate the contribution of the X-ray point light source at the O ’position to the entire particle excitation fluorescence with intensity I_j. Figure 1 dφ corresponding to the three-dimensional ring