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用碳硼烷加氦直流辉光放电，在ＨＬ－１Ｍ托卡马克内壁上原位涂覆了含碳硼膜，平均厚度５０—７０ｎｍ，硼碳比约为１６。硼化后器壁条件有了本质的改善，对器壁上氧源的抑制特别显著，也增强了石墨表面抗氢离子和氢原子化学蚀刻的能力。硼化显著改善了等离子体性能和提高了等离子体参数。扰动显著减小，放电稳定性和重复性提高。硼化为低混杂波电流驱动实验创造了良好的壁条件。
With borane plus helium direct current glow discharge, the inner wall of HL-1M tokamak coated with carbon-containing boron film, the average thickness of 50-70nm, boron carbon ratio of about 16. Boronization wall conditions have been essentially improved, the inhibition of the oxygen source on the wall is particularly significant, but also enhance the graphite surface resistance to hydrogen ions and hydrogen atoms chemical etching ability. Boronization significantly improves plasma performance and increases plasma parameters. Disturbance was significantly reduced, discharge stability and repeatability increased. Boronization creates a good wall condition for low-noise hybrid current-driven experiments.