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一、引言由于铝蒸镀膜的电导率高,可用于LSI的布线或用作聚光器膜等,还由于它具有很高的分光反射率,也可作为反射膜使用。无论属于哪一种情况,其实用膜的强度都与膜的硬度及膜与衬底间的吸附力有关,特别是吸附力对膜的耐久性具有很大的影响。为此对于铝膜制备条件对吸附力的影响作了各种分析和研究,但是关于采用真空镀膜法时淀积速度给予吸附力的影响的报告却很少。因此,作为改变淀积速度的方法,而分别在改
I. Introduction Due to the high conductivity of aluminum vapor deposition film, it can be used for LSI wiring or condenser film, etc., and also can be used as reflective film due to its high spectral reflectance. In either case, the strength of a practical film is related to the hardness of the film and the adsorption force between the film and the substrate, and in particular, the adsorption force has a great influence on the durability of the film. To this end, various analyzes and studies have been made on the influence of the preparation conditions of the aluminum film on the adsorption force, but few reports on the influence of the deposition rate on the adsorption force using the vacuum deposition method are available. Therefore, as a method of changing the deposition rate, respectively, are changed