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给出了几种高效制备Ir/Re复合材料(CVD方法制备)金相的方法。发现Re层组织分为靠近Ir层的细晶粒区和柱状晶粒区,分别测定了相应晶粒度。同时对退火孪晶、V,W型侵蚀纹和晶界上的kirkendall孔洞等的特点进行观察和分析。通过Ir层组织的SEI像,了解了Ir晶粒的形貌和生长特点,同时计算并给出了Ir晶粒的生长动力学方程。
Several methods to prepare the metallographic phase of Ir / Re composites (CVD method) are presented. The structure of Re layer was found to be divided into the fine grain region near the Ir layer and the columnar grain region, and the corresponding grain sizes were respectively determined. At the same time, the characteristics of annealing twins, V, W erosion patterns and kirkendall holes on grain boundaries were observed and analyzed. Through the SEI images of Ir layer, the morphologies and growth characteristics of Ir grains were studied. The growth kinetics equations of Ir grains were also calculated and presented.