Preparation of a Novel Cationic Photosensitive Resin (3D-SLR01) for Stereolithography 3D Printing an

来源 :武汉理工大学学报(材料科学版)(英文版) | 被引量 : 0次 | 上传用户:supphia
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A novel cationic photosensitive resin (3DSLR-01) for stereolithography 3D printing was prepared with 3,4-epoxycyclohexylmethyl-3\',4\'-epoxycyclohexane carboxylate (2021P),1,4-cyclohexanedimethanol glycidyl ether (JX-026),diglycidyl 4,5-epoxycyclohexane-l,2-dicarboxylate (S-186),polycaprolactone polyol(Polyol-0305),novolac epoxy resin(F-51),bis(3-ethyl-3-oxetanylmethyl) ether (S-221) and a mixture of triarylsulfonium hexafluoroantimonate salts solution (UVI-6976).The properties of the photosensitive resin and its UV-cured films were investigated by some instruments and equipment.The experimental results show that the critical exposure (Ec) of the photosensitive resin is 16.3 mJ/cm2,the penetration depth (Dp) is 0.14 mm,and the optical property of the photosensitive resin is excellent.Rectangle plates were printed by using a stereolithography apparatus (HRPL-150A) with the photosensitive resin as the manufacturing material,and the shrinkage rates of the plates were less than 0.60%,which showed that the accuracy of the manufactured plates was very high.
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