【摘 要】
：
本文对氮化碳的结构及制备工艺如溅射、化学气相沉积、离子束辅助沉积、激光烧蚀等作了较为详细的总结与分析，对各种制备工艺条件下的氮化碳的性能包括力学、电学及光学性能进
【机 构】
：
中国科学院上海硅酸盐研究所!上海，200050,中国科学院上海硅酸盐研究所!上海，200050,中国科学院上海硅酸盐研究所!上海，200050
论文部分内容阅读
本文对氮化碳的结构及制备工艺如溅射、化学气相沉积、离子束辅助沉积、激光烧蚀等作了较为详细的总结与分析，对各种制备工艺条件下的氮化碳的性能包括力学、电学及光学性能进行了讨论，并对今后的发展趋势提出了自己的见解．
In this paper, the structure and preparation of carbonitride such as sputtering, chemical vapor deposition, ion beam assisted deposition, laser ablation and so made a more detailed summary and analysis of the performance of carbon nitride under various manufacturing conditions include Mechanical, electrical and optical properties were discussed, and put forward their own views on the future trends.
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