采用光刻及离子束蚀刻技术制作面阵石英 DNA芯片模版 ,利用扫描电子显微镜 ( SEM)和表面轮廓仪测试了所制石英 DNA芯片模版的表面微结构形貌特征 ,分析了所制石英 DNA芯片模版出现图形畸变的原因。所用工艺为在其它衬底材料表面制作更大规模及具有复杂结构的大面阵 DNA芯片模版奠定了基础 The lithography and ion beam etching techniques were used to fabricate a face-quartz quartz chip template. The surface morphology of the quartz DNA chip stencil was tested by scanning electron microscopy (SEM) and surface profiler. The reason for the pattern distortion appears in the template. The process used to lay the foundation for the production of large-scale and complex structure of large area array DNA chip template on the surface of other substrate materials