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蒸发源是真空镀膜装置中一个非常重要的部件。在多个蒸发源共存的装置中,如何在设计中正确选择蒸发源与蒸发源、蒸发源与基片之间的距离就显得尤为重要,它直接关系到基板涂层均匀性。本篇文章根据蒸发源与基片之间的物理联系入手,分析基片--蒸发源距离对基片涂层均匀性的影响,进而对蒸发源与蒸发源、蒸发源与基片之间距离的确定,提出了自己的一些观点和看法。
Evaporation source is a very important part of vacuum coating equipment. In the co-existence of multiple evaporation sources, how to correctly select the evaporation source and the evaporation source in the design, the evaporation source and the distance between the substrate is particularly important, which is directly related to the substrate coating uniformity. Based on the physical connection between the evaporation source and the substrate, this article analyzes the influence of the distance between the substrate and the evaporation source on the uniformity of the substrate coating, and then analyzes the evaporation source and evaporation source, the distance between the evaporation source and the substrate The definition, put forward some of their own views and opinions.