氧化铈颗粒在磁流变抛光液中的聚集-分散行为研究

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磁流变抛光液中双相颗粒的聚集分散行为关系到其流变性能及微观去除过程,本文通过对磁流变抛光液流变性能和微观结构的研究,分析了不同粒径的氧化铈抛光粉在抛光液中的聚集分散行为。实验表明,在相同工艺条件下,加入了不同粒径氧化铈抛光粉的磁流变抛光液的剪切屈服应力和零场粘度最大差距可达12倍与8倍。分析认为,粒径越小的氧化铈颗粒对磁流变抛光液的影响越明显:氧化铈粒径小,颗粒易团聚而增大粘度,同时也减小了抛光液中颗粒平均粒径和间距,增大了剪切作用。 The aggregation and dispersion behavior of two-phase particles in MR fluid is related to the rheological behavior and microscopic removal process. In this paper, the rheological properties and microstructure of MR fluid are studied, and the effects of cerium oxide polishing Aggregation and dispersion behavior of powder in slurry. Experiments show that under the same process conditions, the difference between the shear yield stress and the zero-field viscosity of MRFs with different particle size of cerium oxide polishing powder can reach 12 times and 8 times. The analysis shows that the smaller the particle size of the cerium oxide particles on the MR fluid polishing more obvious: cerium oxide particle size is small, easy to agglomerate the particles to increase the viscosity, but also reduces the average particle size and pitch in the polishing solution , Increased shear effect.
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