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:Zn O∶ Al是一种 N型半导体材料 ,具有透明氧化导电薄膜优良的光电特性 ,本文着重地介绍了直流和射频磁控反应溅射下 ,各种工艺参数对 Zn O∶ Al薄膜电阻率的影响
: Zn O: Al is an N-type semiconductor material with excellent optical and electrical properties of a transparent oxide conductive film. In this paper, the effects of various process parameters on the resistivity of a Zn O: Al thin film under DC and RF magnetron reactive sputtering Impact